报告人：Andrew V. Teplyakov 教授
University of Delaware
Copper and silver deposition onto solid substrate forms a foundation for multiple applications, from catalysis to microelectronics and photonics. The key practical issue in the deposition process is the formation of the interface between the metal deposited and the substrate material. The control over the formation of this interface in chemical deposition schemes depends on the possibility to tune the chemical reactions leading to the deposition. This in turn depends on the actual surface functionalities available and their distribution on the surface. Thus, understanding and controlling these reactions is of paramount importance for producing the desired interfaces.
Chemical interactions of several copper and silver deposition precursor molecules with functionalized silicon, silica and carbon (ordered pyrolytic graphite, HOPG) surface will be discussed targeting specifically the chemistry of adsorption and decomposition depending on the precursor ligands and oxidation states of the metal. The study considers surface chemical functional groups available on the surfaces of these different materials and the mechanistic understanding is supported by microscopic (atomic force microscopy, scanning electron microscopy, transmission electron microscopy) and spectroscopic (X-ray photoelectron spectroscopy, time of flight secondary ion mass spectrometry, and infrared spectroscopy) methods supported by the density functional calculations. The work with copper deposition precursors targets Cu(acac)2, Cu(hfac)2, and Cu(hfac)VTMS. The more challenging and far less investigated reactions of silver precursor molecules are mostly focused on trimethylphosphine(hexafluoroacetylacetonato)silver(I). These molecules possess very different reactivities with respect to different surface functionalities and substrates; however, understanding the mechanisms of surface reactions allows to direct the deposition to prepare surface metallic nanostructures and thin films with well-defined interfaces between the metals deposited and underlying substrates.
Doctor of Philosophy in Physical Chemistry, Columbia University, New York, NY. 1997
Master of Philosophy in Chemistry, Columbia University, New York, NY. 1996
Master of Arts in Chemistry, Columbia University, New York, NY. 1994
Bachelor of Science in Chemistry, Moscow State University, Moscow, Russia. 1992
PRIMARY RESEARCH INTERESTS:
Surface chemical functionalization for molecular and microelectronics, nanostructures and thin films, materials and structures for sustainable energy, electronic properties of covalently bound chemical and biological systems on semiconductor substrates, experimental and computational studies of surface chemical reactivity.
2008-Present. Professor at the University of Delaware
2004-2008. Associate professor at the University of Delaware.
1998-2004. Assistant professor at the University of Delaware.
AWARDS AND HONORS:
University of Delaware Outstanding Doctoral Graduate Advising and Mentoring Award, 2016.
Invited LaMattina Lectureship at the Department of Chemistry, University of New Hampshire (Durham, NH), 2014
American Chemical Society Delaware Section Award, 2012.
Top Cited Author Surface Science Reports award based on Scopus citations from 2005-2009.
American Chemical Society (USA)
American Vacuum Society (USA)
Sigma Xi (USA)
Center for Catalytic Science and Technology at the University of Delaware (1998-present)
SERVICE TO THE GREATER SCIENTIFIC COMMUNITY:
Associate Editor (2014-present): Applied Surface Science
Editorial Advisory Board Member (2016-present): Surface Science, Langmuir
Subject Editor: Encyclopedia of “Interfacial Chemistry: Surface Science and Electrochemistry, Major Reference Work, Editor-in-Chief: Professor Klaus Wandelt.
Guest Editor: Applied Surface Science, Special Issue: Special Topics on Surfaces and Interfaces for Renewable Energy (co-edited with R. L. Opila, J. Whitten, and P. Sheldon), 2014, v. 323.
Alternate Councilor (2016-present): American Chemical Society, Division of Colloid and Surface science.
Executive Board member (2016-present): American Vacuum Society, Surface Science Division.